Molecular Passivation of Substrate Step Edges as Origin of Unusual Growth Behavior of 4,4´-Biphenyl Dicarboxylic Acid on Cu(001)

JOURNAL OF PHYSICAL CHEMISTRY C (PRINT)

KORMOŠ, L.; PROCHÁZKA, P.; ŠIKOLA, T.; ČECHAL, J., 2018: Molecular Passivation of Substrate Step Edges as Origin of Unusual Growth Behavior of 4,4´-Biphenyl Dicarboxylic Acid on Cu(001). JOURNAL OF PHYSICAL CHEMISTRY C (PRINT) 122(5), p. 2815 - 6, doi: 10.1021/acs.jpcc.7b11436; FULL TEXT
(UHV-SPM, UHV-LEEM, UHV-PREPARATION)

Equipment:

• Ultra High Vacuum Preparation and Analytical System - Scanning Probe Microscopy SPECS Aarhus 150 SPM (UHV-SPM)
• Ultra High Vacuum Preparation and Analytical System - Low Energy Electron Microscope SPECS FE-LEEM P90 (UHV-LEEM)
• Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)

Research Groups:

• Molecular Nanostructures at Surfaces
• CF: CEITEC Nano
• Fabrication and Characterisation of Nanostructures

CEITEC authors:

• Prof. Tomáš Šikola
• Pavel Procházka, Ph.D.
• Prof. Jan Čechal, Ph.D.