Substrate-temperature-driven phase stabilization and strain modulation in BiFeO3/Ti/Si heterostructures for scalable silicon integration

JOURNAL OF ALLOYS AND COMPOUNDS

FAWAEER, S.; AL-QAISI, W.; SEDLÁKOVÁ, V.; MOUSA, M.; KNÁPEK, A.; SOBOLA, D., 2025: Substrate-temperature-driven phase stabilization and strain modulation in BiFeO3/Ti/Si heterostructures for scalable silicon integration. JOURNAL OF ALLOYS AND COMPOUNDS 1047, doi: 10.1016/j.jallcom.2025.184949; FULL TEXT
(VERIOS, ICON-SPM, WOOLLAM-VIS, KRATOS-XPS, RIGAKU3, VERSALAB, MAGNETRON)

Equipment:

• High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)
• NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE (WOOLLAM-VIS)
• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
• X-ray powder diffractometer Rigaku SmartLab 3kW (RIGAKU3)
• Cryogenic-free VSM and ETO measurement system – Quantum Design, VersaLab (VERSALAB)
• Magnetron sputtering system BESTEC (MAGNETRON)

Research Groups:

• Advanced Ceramic Materials
• CF: CEITEC Nano

CEITEC authors:

• Prof. Dinara Sobola, Ph.D.
• Vlasta Sedláková, Ph.D.
• Saleh Hekmat Saleh Fawaeer
• Wala´ Al-Qaisi