Substrate-temperature-driven phase stabilization and strain modulation in BiFeO3/Ti/Si heterostructures for scalable silicon integration
JOURNAL OF ALLOYS AND COMPOUNDS
FAWAEER, S.; AL-QAISI, W.; SEDLÁKOVÁ, V.; MOUSA, M.; KNÁPEK, A.; SOBOLA, D., 2025: Substrate-temperature-driven phase stabilization and strain modulation in BiFeO3/Ti/Si heterostructures for scalable silicon integration. JOURNAL OF ALLOYS AND COMPOUNDS 1047, doi: 10.1016/j.jallcom.2025.184949; FULL TEXT
(VERIOS, ICON-SPM, WOOLLAM-VIS, KRATOS-XPS)
Equipment:
- High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
- Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)
- NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE (WOOLLAM-VIS)
- X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
Research Groups:
CEITEC authors:
+420 54114 9207
nano@ceitec.vutbr.cz
