Parylene Micropillars Coated with Thermally Grown SiO2

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

LIU, X.; FECKO, P.; FOHLEROVÁ, Z.; PEKÁREK, J.; KARÁSEK, T.; NEUŽIL, P., 2020: Parylene Micropillars Coated with Thermally Grown SiO2. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 38(6), p. 38 - 6, doi: 10.1116/6.0000558; FULL TEXT
(SUSS-MA8, SUSS-RCD8, DWL, DRIE, RIE-FLUORINE, PARYLENE-SCS, XEF2, APCVD, LYRA)

Equipment:

• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• Resist coating and development system SÜSS MicroTec RCD8 (SUSS-RCD8)
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs (DWL)
• Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 (DRIE)
• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
• SCS Parylene Deposition System (PARYLENE-SCS)
• XeF2 Etching of Silicon (XEF2)
• Atmospheric Pressure Chemical Vapor Deposition (APCVD)
• Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)

Research Groups:

• CF: CEITEC Nano

CEITEC authors:

• Peter Fecko
• Zdenka Fohlerová, Ph.D.
• Prof. Pavel Neužil