
Preparation of surfaces with diffusion barrier for studying initial phase of semiconductor nanowire growth
Bachelor’s thesis
Andrýsek, M., 2016: Preparation of surfaces with diffusion barrier for studying initial phase of semiconductor nanowire growth. BACHELOR’S THESIS , p. 1 - 22
(VERIOS, ALD-FIJI, LYRA)
Equipment:
- High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
- Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD-FIJI)
- Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)
Research Groups: