Mechanical strain and electric-field modulation of graphene transistors integrated on MEMS cantilevers

JOURNAL OF MATERIALS SCIENCE

GABLECH, I.; BRODSKÝ, J.; VYROUBAL, P.; PIASTEK, J.; BARTOŠÍK, M.; PEKÁREK, J., 2022: Mechanical strain and electric-field modulation of graphene transistors integrated on MEMS cantilevers. JOURNAL OF MATERIALS SCIENCE 57(3), p. 1923 - 13, doi: 10.1007/s10853-021-06846-6; FULL TEXT
(RIE-FLUORINE, DRIE, EVAPORATOR, WIRE-BONDER, WITEC-RAMAN, MPS150, KEITHLEY-4200, SUSS-MA8, DWL)

Equipment:

• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
• Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 (DRIE)
• Electron beam evaporator BESTEC (EVAPORATOR)
• Wire bonder TPT HB 16 (WIRE-BONDER)
• Witec Alpha 300R (WITEC-RAMAN)
• 4-probe station Cascade Microtech MPS 150 (MPS150)
• Keithley 4200-SCS Parameter Analyzer (KEITHLEY-4200)
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs (DWL)

Research Groups:

• CF: CEITEC Nano
• Fabrication and Characterisation of Nanostructures
• Bioelectronics Materials and Devices

CEITEC authors:

• Miroslav Bartošík, Ph.D.
• Jakub Piastek, Ph.D.
• Imrich Gablech, Ph.D.
• Jan Brodský