Progress toward the development of single nanowire-based arrays for gas sensing applications

Ph.D Thesis

Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS , p. 1 - 199
(ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, NANOCALC, MPS150, WIRE-BONDER, ICON-SPM)

Equipment:

• Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs (DWL)
• Ion-Beam Sputter Deposition System BESTEC (KAUFMAN)
• Resist stripper Diener electronic NANO Plasma cleaner (DIENER)
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• Resist coating and development system SÜSS MicroTec RCD8 (SUSS-RCD8)
• E-beam writer RAITH150 Two (RAITH)
• Magnetron sputtering system BESTEC (MAGNETRON)
• Electron beam evaporator BESTEC (EVAPORATOR)
• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
• Ion beam etching Scia Systems Coat 200 (SCIA)
• Mechanical profilometer Bruker Dektak XT (DEKTAK)
• Spectroscopic reflectometer Ocean Optics NanoCalc 2000 (NANOCALC)
• 4-probe station Cascade Microtech MPS 150 (MPS150)
• Wire bonder TPT HB 16 (WIRE-BONDER)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)

Research Groups:

• CF: CEITEC Nano