Non-epitaxial integration of strain-tuned polycrystalline BiFeO3 thin films for silicon-based optoelectronics

Optical Materials

Fawaeer, S. H.; Al-Qaisi, W. M.; Sedláková, V.; Mousa, M. S.; Knápek, A.; Sobola, D., 2026: Non-epitaxial integration of strain-tuned polycrystalline BiFeO3 thin films for silicon-based optoelectronics. OPTICAL MATERIALS 169, doi: 10.1016/j.optmat.2025.117577; FULL TEXT
(RIGAKU3, KRATOS-XPS, VERIOS, ICON-SPM, WOOLLAM-VIS, MAGNETRON)

Equipment:

• X-ray powder diffractometer Rigaku SmartLab 3kW (RIGAKU3)
• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
• High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)
• NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE (WOOLLAM-VIS)
• Magnetron sputtering system BESTEC (MAGNETRON)

Research Groups:

• Advanced Ceramic Materials
• CF: CEITEC Nano

CEITEC authors:

• Dinara Sobola, Ph.D.
• Saleh Hekmat Saleh Fawaeer