Nanostructured Gold Microelectrode Array for Ultrasensitive Detection of Heavy Metal Contamination

PODEŠVA, P.; GABLECH, I.; NEUŽIL, P., 2018: . ANALYTICAL CHEMISTRY 90(2), p. 1161 - 7, doi: 10.1021/acs.analchem.7b0372; FULL TEXT
(SUSS-MA8, DWL, SCIA, DIENER)

Equipment:

• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs (DWL)
• Ion beam etching Scia Systems Coat 200 (SCIA)
• Resist stripper Diener electronic NANO Plasma cleaner (DIENER)

Research Groups:

• CF: CEITEC Nano

CEITEC authors:

• Prof. Pavel Neužil
• Imrich Gablech, Ph.D.