Nanometer - Thick titanium film as a silicon migration barrier

MATERIALS TODAY COMMUNICATIONS

FAWAEER, S.; AL-QAISI, W.; SEDLÁKOVÁ, V.; TRUNEC, M.; SOBOLA, D.; MOUSA, M., 2024: Nanometer - Thick titanium film as a silicon migration barrier. MATERIALS TODAY COMMUNICATIONS 40, p. 1 - 17, doi: 10.1016/j.mtcomm.2024.109326; FULL TEXT
(KRATOS-XPS, WITEC-RAMAN, ICON-SPM, EVAPORATOR)

Equipment:

• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
• Witec Alpha 300R (WITEC-RAMAN)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)
• Electron beam evaporator BESTEC (EVAPORATOR)

Research Groups:

• Advanced Ceramic Materials
• CF: CEITEC Nano

CEITEC authors:

• Prof. Martin Trunec
• Dinara Sobola, Ph.D.
• M.Sc. Saleh Hekmat Saleh Fawaeer
• M.Sc. Wala´ Al-Qaisi