
Monitoring On-Surface Chemical Reactions by Low-Energy Electron Microscopy: from Conformation Change to Ring Closure in 2D Molecular Gas
CHEMISTRY - A EUROPEAN JOURNAL
Prochazka, P.; Frezza, F.; Sánchez-Grande, A.; Carrera, M.; Chen, QF.; Stará, V.; Kurowská, A.; Curiel, D.; Jelínek, P.; Cechal, J., 2025: Monitoring On-Surface Chemical Reactions by Low-Energy Electron Microscopy: from Conformation Change to Ring Closure in 2D Molecular Gas. CHEMISTRY - A EUROPEAN JOURNAL 31(20), p. 1 - 6, doi: 10.1002/chem.202500561; FULL TEXT
(UHV-LEEM, UHV-SPM, UHV-DEPOSITION, UHV-PREPARATION)
Equipment:
- Ultra High Vacuum Preparation and Analytical System - Low Energy Electron Microscope SPECS FE-LEEM P90 (UHV-LEEM)
- Ultra High Vacuum Preparation and Analytical System - Scanning Probe Microscopy SPECS Aarhus 150 SPM (UHV-SPM)
- Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)
- Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)
Research Groups:
CEITEC authors: