CEITEC Nano Research Infrastructure
Brno University of Technology
Purkyňova 123, 612 00 Brno
Czech Republic
+420 54114 9207
nano@ceitec.vutbr.cz
Consumables | wh | ShP | i | feedback
Metal organic chemical vapor deposition (MOCVD) (MOCVD)
Guarantor:
Filip Münz, Ph.D.
Instrument status:
Operational, 5.3.2019 09:58, Testing regime - contact guarantee for assanator training
Equipment placement:
CEITEC Nano - C1.34
Facilities and methods enabling nanolayer and single atom layer deposition, nanostructure preparation and fabrication of new devices and systems (electronic, photonic, electromechanical).
Photogallery
Specification
| substrate temperature range | from room temp. up to 800 °C |
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| bubbler temperature control | 10–50 °C |
| CEM line heater | up to 70 °C |
| pressure control | 0.1–103 kPa |
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| designed materials | TiO2, Fe2O3, BaTiO3, PbZrTiO3, HfO2 |
| nonhomogeneity | < 3% |
Documents
Documents
Here is place for your documents.