Low pressure chemical vapor deposition - Nitrides (LPCVD-SiN)


Guarantor:
Filip Münz, Ph.D.

Instrument status:
Operational Operational, 9.2.2018 16:44

Equipment placement:
CEITEC Nano - C1.34


Facilities and methods enabling nanolayer and single atom layer deposition, nanostructure preparation and fabrication of new devices and systems (electronic, photonic, electromechanical).

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