CEITEC Nano Research Infrastructure
Brno University of Technology
Purkyňova 123, 612 00 Brno
Czech Republic
+420 54114 9207
nano@ceitec.vutbr.cz
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Low pressure chemical vapor deposition - Nitrides (LPCVD-SiN)
Guarantor:
Radim Hrdý, Ph.D.
Instrument status:
Operational, 3.10.2025 08:00
Equipment placement:
CEITEC Nano - C1.34
System for a precisely controlled growth of silicon nitride in horizontal quartz tubes with soft-loading placement of boats holding up to 50 wafers in one run. Temperature is controlled in 3 independent zones. The basic process consists of a low-pressure process from SiH2Cl2 and NH3 precursors.
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