Low pressure chemical vapor deposition - Nitrides (LPCVD-SiN)


Guarantor:
Radim Hrdý, Ph.D.

Instrument status:
Operational Operational, 3.10.2025 08:00

Equipment placement:
CEITEC Nano - C1.34


Facilities and methods enabling nanolayer and single atom layer deposition, nanostructure preparation and fabrication of new devices and systems (electronic, photonic, electromechanical).

Photogallery

Specification

Here is place to edit your specification.

Documents

Here is place for your documents.