Low pressure chemical vapor deposition - Nitrides (LPCVD-SiN)
Guarantor:
Radim Hrdý, Ph.D.
Instrument status:
Operational, 3.10.2025 08:00
Equipment placement:
CEITEC Nano - C1.34
Facilities and methods enabling nanolayer and single atom layer deposition, nanostructure preparation and fabrication of new devices and systems (electronic, photonic, electromechanical).
Photogallery
Specification
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Documents
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+420 54114 9207
nano@ceitec.vutbr.cz
