Hydrofluoric acid-free etched MAX on 3D-printed nanocarbon electrode for photoelectrochemical hydrogen production

APPLIED MATERIALS TODAY

NOUSEEN, S.; GHOSH, K.; PUMERA, M., 2024: Hydrofluoric acid-free etched MAX on 3D-printed nanocarbon electrode for photoelectrochemical hydrogen production. APPLIED MATERIALS TODAY 36, doi: 10.1016/j.apmt.2023.101995; FULL TEXT
(RIGAKU3, VERIOS, LYRA, KRATOS-XPS, JASCO)

Equipment:

• X-ray powder diffractometer Rigaku SmartLab 3kW (RIGAKU3)
• High resolution Scanning Electron Microscope FEI Verios 460L (VERIOS)
• Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)
• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)
• UV/Vis/NIR Spectrophotometer Jasco V-770 (JASCO)

Research Groups:

• Future Energy and Innovation
• CF: CEITEC Nano

CEITEC authors:

• Shaista Nouseen
• Prof. Martin Pumera, Ph.D.