Confined Reactivity in the van der Waals Gap beneath Graphene: Supply-Limited Kinetics and Emergent Reaction Pathways

Mirdamadi, H.; Wang, R.; David, J.; Jiang, T.; Wang, Y.; Vařeka, K.; Dymáček, M.; Bábor, P.; Šikola, T.; Kolíbal, M., 2026: . ACS NANO 20(10), p. 8255 - 8265, doi: 10.1021/acsnano.5c12130; FULL TEXT
(UHV-DEPOSITION, UHV-LEEM, UHV-XPS, SIMS)

Equipment:

• UHV Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)
• UHV Preparation and Analytical System - Low Energy Electron Microscope SPECS FE-LEEM P90 (UHV-LEEM)
• UHV Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)
• Secondary Ion Mass Spectroscopy ION-TOF TOF.SIMS5 (SIMS)

Research Groups:

• Fabrication and Characterisation of Nanostructures
• CF: CEITEC Nano

CEITEC authors:

• Prof. Tomáš Šikola
• Sayed Hossein Mirdamadi Khouzani