Comparison of on-chip MIS capacitors based on stacked HfO2/Al2O3 nanolaminates

MATERIALS TODAY COMMUNICATIONS

KARTCI, A.; VANČÍK, S.; PRÁŠEK, J.; HRDÝ, R.; SCHNEIDER, M.; SCHMID, U.; HUBÁLEK, J., 2022: Comparison of on-chip MIS capacitors based on stacked HfO2/Al2O3 nanolaminates. MATERIALS TODAY COMMUNICATIONS 33, p. 1 - 8, doi: 10.1016/j.mtcomm.2022.104664; FULL TEXT
(ALD, EVAPORATOR, SUSS-MA8, SUSS-RCD8, MAGNETRON, TITAN, MPS150, KEITHLEY-4200, SUMMIT, KRATOS-XPS)

Equipment:

• Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 (ALD)
• Electron beam evaporator BESTEC (EVAPORATOR)
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• Resist coating and development system SÜSS MicroTec RCD8 (SUSS-RCD8)
• Magnetron sputtering system BESTEC (MAGNETRON)
• High-resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed (TITAN)
• 4-probe station Cascade Microtech MPS 150 (MPS150)
• Keithley 4200-SCS Parameter Analyzer (KEITHLEY-4200)
• Semi-automated 4-probe system Cascade Microtech SUMMIT 12000 (SUMMIT)
• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)

Research Groups:

• CF: CEITEC Nano

CEITEC authors:

• Jan Prášek, Ph.D.
• Radim Hrdý, Ph.D.
• Prof. Jaromír Hubálek, Ph.D.