ATC Orion 8 Deposition system (MAGNETRON-AJA)


Guarantor:
Kryštof Jasenský

Instrument status:
Operational Operational, 8.6.2026 11:21, Installed targets: Tb(1), Co(2), MgO(3), Ta(4), SiO2(5), Ti(6), Cu(7)


ATC Orion 8 Deposition System is an advanced magnetron sputtering platform designed for research and development of thin films using physical vapor deposition (PVD) techniques. The system features six confocal magnetron sputtering sources, an automated load-lock for rapid sample exchange, and comprehensive computer control of deposition processes. It supports substrates up to 4 inches in diameter, with capabilities including substrate heating up to 850 °C, rotation, RF/DC biasing, and precise process gas management. Combining ultra-high vacuum performance, excellent film uniformity, and support for reactive and co-sputtering processes, the Orion 8 is ideally suited for the fabrication of advanced functional, electronic, optical, magnetic, and spintronic materials.

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