Area-Selective Atomic Layer Deposition of ZnO on Si\SiO₂ Modified with Tris(dimethylamino)methylsilane

MATERIALS

Moeini, B.; Avval, TG.; Brongersma, HH.; Prusa, S.; Babik, P.; Vanickova, E.; Strohmeier, BR.; Bell, DS.; Eggett, D.; George, SM.; Linford, MR., 2023: Area-Selective Atomic Layer Deposition of ZnO on Si\SiO₂ Modified with Tris(dimethylamino)methylsilane. MATERIALS 16(13), doi: 10.3390/ma16134688; FULL TEXT
(UHV-LEIS)

Equipment:

• Ultra High Vacuum Preparation and Analytical System - Low Energy Ion Spectroscopy ION-TOF Qtac 100 (UHV-LEIS)

Research Groups:

• Fabrication and Characterisation of Nanostructures
• CF: CEITEC Nano

CEITEC authors:

• Stanislav Průša, Ph.D.
• Pavel Bábík
• Elena Vaníčková