APCVD-Diffusion (APCVD-Diffusion)

System for a precisely controlled atmospheric P-type diffusion on silicon wafers in horizontal quartz tubes with soft-loading placement of boats holding up to 50 wafers in one run. Temperature is controlled in 3 independent zones. Doping is possible using POCl3 precursors in a quartz bubbler tank. Excessive deposits are cleaned using dichloroethylene (DCE) injection.