Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications

Vacuum

Drevet, R.; Souček, P.; Mareš, P.; Ondračka, P.; Dubau, M.; Kolonits, T.; Czigány, Z.; Balázsi, K.; Vašina, P., 2024: Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications. VACUUM 221, p. 1 - 14, doi: 10.1016/j.vacuum.2023.112881; FULL TEXT
(KRATOS-XPS)

Equipment:

• X-ray Photoelectron Spectroscopy Axis Supra (KRATOS-XPS)

Research Groups:

• CF: CEITEC Nano