Affordable method for channel geometry–specific flow control in microfluidics without commercial pumps

Liu, X.; Brodský, J.; Vírostko, J.; Jarušek, J.; Migliaccio, L.; Zítka, O.; Gablech, I.; Neužil, P., 2025: . SCIENTIFIC REPORTS 15(1), doi: 10.1038/s41598-025-24442-5; FULL TEXT
(DRIE, SUSS-MA8, RIE-FLUORINE)

Equipment:

• Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 (DRIE)
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 (SUSS-MA8)
• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)

Research Groups:

• CF: CEITEC Nano

CEITEC authors:

• Prof. Pavel Neužil
• Jan Brodský, Ph.D.
• Imrich Gablech, Ph.D.