Ultra High Vacuum Preparation and Analytical System - Pulsed Laser Deposition TSST (UHV-PLD)

The pulsed laser deposition preparation chamber (UHV-PLD) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. The UHV-PLD is used for the preparation of oxide-based layers, it provides a possibility of epitaxial growth of oxide heterostructures, ozone-assisted growth, and masking option. It is equipped with a UV-laser 248nm 700mJ 10Hz, high-precision RHEED, sample heating by IR laser, and independent load-lock.