Target surfacing system Leica TXP (LEICA-TXP)


Target surfacing system Leica TXP

Guarantor:
Jiří Holas

Instrument status:
Operational Operational, 27.8.2021 14:33

Equipment placement:
CEITEC Nano - A1.04


The instrument is designed to pre-prepare samples for electron as well as light microscopy techniques before they are treated by the ion polishing system Leica TIC3X. Excess material is removed by mechanical milling, grinding, cutting, or polishing without the need to repeatedly attach the sample onto a different carrier. The sample can be positioned in four axes. It is possible to work directly with pin-stub mounted samples SEM.
The instrument is also capable of manufacturing TEM thin foils of 3 and 2,3 mm diameter.

Photogallery

Specification

Rotational speed
300 - 20 000 rpm
Lubricant flow
2 - 20 ml/min
Spindle travel range
12 mm
Step size
0,5 - 100 µm (0,5 ;1 ;10 ;100)
E-W (East-West) travel range
24 mm
E-W movement of the spindle
0,025 - 0,5 mm/sec
Recommended sample size
up to 60 mm2 max


Documents

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