Rapid thermal annealing Xerion XREACT/1 250°C

Filip Münz

The heating sources for the XREACT radiation furnaces are halogen lamps or short arc lamps. Heating rates up to 200 °C/s are possible. In our Rapid Thermal Processing (RTP) systems wafers can be annealed. As components of testing machines, the radiation furnaces are very small and it is especially used for thermo mechanic fatigue (TMF) tests.

24 halogen lamps

maximum temperature 1 250 °C

temperature gradient 200 °C/s

repeatability ±1.5 °C

controlled by pyrometer and thermocoupler

vacuum 1 × 10–5 Pa

sample size up to 4”