Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage

2019 42ND INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY (ISSE)

Prasek, J; Houska, D; Hrdy, R; Hubalek, J; Schmid, U, 2019: Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage. 2019 42ND INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY (ISSE)
(DRIE, ICON-SPM)

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