Metal organic chemical vapor deposition (MOCVD) (MOCVD)


Guarantor:
Filip Münz, Ph.D.

Instrument status:
Operational Operational, 5.3.2019 09:58, Testing regime - contact guarantee for assanator training

Equipment placement:
CEITEC Nano - C1.34


Facilities and methods enabling nanolayer and single atom layer deposition, nanostructure preparation and fabrication of new devices and systems (electronic, photonic, electromechanical).

Photogallery

Specification

substrate temperature range from room temp. up to 800 °C
bubbler temperature control 10–50 °C
CEM line heater up to 70 °C
pressure control 0.1–103 kPa


designed materials TiO2, Fe2O3, BaTiO3, PbZrTiO3, HfO2
nonhomogeneity < 3%


Documents



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