Low pressure chemical vapor deposition - Nitrides (LPCVD-SiN)
Guarantor:
Filip Münz, Ph.D.
Instrument status:
Operational, 6.5.2024 14:56
Equipment placement:
CEITEC Nano - C1.34
Facilities and methods enabling nanolayer and single atom layer deposition, nanostructure preparation and fabrication of new devices and systems (electronic, photonic, electromechanical).
Photogallery
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