CEITEC Nano Research Infrastructure
Brno University of Technology
Purkyňova 123, 612 00 Brno
Czech Republic
+420 54114 9207
nano@ceitec.vutbr.cz
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Lithographic wetbench for coating (SUSS-WETBENCH)
Guarantor:
Radim Hrdý, Ph.D.
Instrument status:
Operational, 15.8.2024 16:54
Equipment placement:
CEITEC Nano - C1.30
The RCD8 coat and develop platform can be custom tailored anywhere from e.g. a basic manual spin coater to a GYRSET® enhanced coater and puddle & spray developer tool. It can handle small pieces as well as standard wafers up to 200 mm and serves therefore ideally for daily R&D work up to small scale production.
Photogallery
Specification
LabSpin 6
sample size: from 1 × 1 cm to 4"
rotational speed: up to 6000 RPM
compatible chemicals (guaranteed): PGMEA, PGME, cyklopentanone, 4-butyrolaktone, 1-methyl-2-pyrollidone, IPA, acetone
max. amount of recipes: 200
max. number of steps in one recipe: 40
step time: 0–999 s
edge bead removal option
HP8
sample size: up to 6" square substrate or 8" wafer
max. amount of recipes: 200
max. number of steps in one recipe: 40
step time: 0–999 s, with 1 s increase
temperature range: 30–250 °C
temperature increase: programmable from 1 °C/min to 10 °C/min
nitrogen purge option, setting of distance from hot plate (more than 0,1 µm) option
VP8
sample size: up to 8" round wafer or 6" square substrate
temperature range: 60–200 °C
vacuum via Venturi nozzle
gas senzor for HMDS and exhaust monitor
Documents
Here is place for your documents.