Effect of deposition angle on fabrication of plasmonic gold nanocones and nanodiscs

Microelectronic Engineering

Liška, J.; Ligmajer, F.; Pinho N. P. V.; Kejík, L.; Kvapil, M.; Dvořák, P.; Horký, M.; Leitner, N. S.; Reimhult, E.; Šikola, T., 2020: Effect of deposition angle on fabrication of plasmonic gold nanocones and nanodiscs. MICROELECTRONIC ENGINEERING 228, p. 111326-1 - 111326-6, doi: 10.1016/j.mee.2020.111326
(LYRA, MIRA, EVAPORATOR, RIE-FLUORINE, ICON-SPM)

Equipment:

• Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)
• Scanning Electron Microscope/E-beam writer TESCAN MIRA3 (MIRA)
• Electron beam evaporator BESTEC (EVAPORATOR)
• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)

Research Groups:

• CF: CEITEC Nano
• Fabrication and Characterisation of Nanostructures - Tomáš Šikola

CEITEC authors:

• Jiří Liška, Ph.D.
• Filip Ligmajer, Ph.D.
• Lukáš Kejík
• Michal Kvapil, Ph.D.
• Petr Dvořák, Ph.D.
• Michal Horký
• Prof. Tomáš Šikola