X-ray Photoelectron Spectroscopy Kratos Axis Supra


Josef Polčák


AXIS Supra is an X-ray photoelectron spectrometer (XPS) with unrivalled automation and ease of use for materials surface characterization. The patented AXIS technology ensures high electron collection efficiency in spectroscopy mode and low aberrations at high magnifications in parallel imaging mode.
X-ray photoelectron spectroscopy (XPS) provides information on elemental composition and chemical bonding states of materials, Ultraviolet photoelectron spectroscopy (UPS) provides information on valence levels and work function of materials, Low energy Ion Scattering spectrometry (ISS) provides evaluation of the elemental composition and structure of solid surfaces. XPS mode is also capable of surface mapping to provide lateral distribution maps of elemental and chemical species at the surface.

The system is also equipped by Argon cluster ion source for sample cleaning or depth profiling.
Surface science station chamber connected to the sample analysis chamber can be configured with a number of surface science techniques. Current configuration offers sample preparation in high temperature gas reaction cell or deposition by effusion cell. After the preparation, samples are transferred to the main chamber for analysis (in-situ).


Load lock chamber (Flexi-lock)

- 3 slots for sample holders
- automated transfer from/to sample analysis chamber
- sample heating/cooling from –100°C to 800°C
- a glovebox could be connected to the flexi-lock for sample handling in inert atmosphere

Sample analysis chamber

• 5 axis precision software controlled manipulator, accuracy 2µm (X, Y, Z axis)
• sample maximum size: diameter 32 mm, thickness 7 mm
• sample heating/cooling from –100°C to 800°C
• magnetic lenses ensure efficient collection of photoelectrons
• lateral resolution 15 µm for spectroscopy, 1 µm for parallel imaging
• detection limits 0.1 to 1 atomic %
• depth resolution: 2 to 8 nm
• energy resolution (FWHM) for Ag 3d5/2 peak < 0.48 eV
• X-ray monochromated source (combined Al/Ag anode, energies 1486.6/2984.2 eV)
• charge neutralisation using low energy electrons for analysis of insulating samples
• gas cluster ion source produces monoatomic/cluster Ar+ ions for sample cleaning/depth profiling (sputtering speed up to 0.5 nm/second)

Surface science station

• samples mounted on 15 mm sample stubs
• sample heating/cooling from –100°C to 600°C
• high temperature gas reaction cell, heating up to 1000°C (1 bar)
• three DN40CF flanges for effusion cells


Kratos Manual