The growth of metastable fcc Fe78Ni22 thin films on H-Si (100) substrates suitable for focused ion beam direct magnetic patterning

Applied Surface Science

Gloss, J.; Horký, M.; Křižáková, V.; Flajšman, L.; Schmid, M.; Urbánek, M.; Varga, P., 2019: The growth of metastable fcc Fe78Ni22 thin films on H-Si (100) substrates suitable for focused ion beam direct magnetic patterning. APPLIED SURFACE SCIENCE 469, p. 747 - 752, doi: 10.1016/j.apsusc.2018.10.263
(LYRA, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, ICON-SPM, KERR-MICROSCOPE)

Equipment:

• Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 (LYRA)
• Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150 (UHV-XPS)
• Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)
• Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS (UHV-DEPOSITION)
• Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)
• Magneto-optical Kerr microscope (KERR-MICROSCOPE)

Research Groups:

• CF: CEITEC Nano
• Nanomagnetism and spintronics - Vojtěch Uhlíř
• Fabrication and Characterisation of Nanostructures - Tomáš Šikola

CEITEC authors:

• Viola Křižáková
• Michal Horký
• Michal Urbánek, Ph.D.