The growth of metastable fcc Fe78Ni22 thin films on H-Si (100) substrates suitable for focused ion beam direct magnetic patterning

Applied Surface Science

Gloss, J.; Horký, M.; Křižáková, V.; Flajšman, L.; Schmid, M.; Urbánek, M.; Varga, P., 2019: The growth of metastable fcc Fe78Ni22 thin films on H-Si (100) substrates suitable for focused ion beam direct magnetic patterning. APPLIED SURFACE SCIENCE 469, p. 747 - 752, doi: 10.1016/j.apsusc.2018.10.263
(LYRA, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, ICON-SPM)

Equipment:

Research Groups:

CEITEC authors: