Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage

INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE

PRÁŠEK, J.; HOUŠKA, D.; HRDÝ, R.; HUBÁLEK, J.; SCHMID, U., 2019: Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE , p. 1 - 6, doi: 10.1109/ISSE.2019.8810293; FULL TEXT
(DRIE, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL, ICON-SPM)

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