Electron beam evaporator BESTEC
In the evaporation process, vapors are produced from a material located in a source (positively charged anode) which is heated by electron beam (given off by a charged tungsten filament). The process is carried out in high vacuum (10−7 to 10−8 mbar) so that the evaporated atoms undergo an essentially collisionless line-of-sight transport prior to condensation on the substrate. The substrate is usually at ground potential (i.e., not biased).
The impact of a high energy electron beam into a metallic sample offers a clean and high energy density method of heating (compared to resistive and inductive type of evaporators). A popular e-beam evaporative source using a strong magnetic field which bends the beam through 270°. The beam can be rastered across the material to melt a significant fraction of the surface.
|Substrate temperature||RT – 900 °C|
|8 materials||please check the Loggbook for current materials inside the Evaporator|
|Sample size||up to 7 × 7”|
|Rotation of substrate||YES|
|Tilt of substrate holder||up 270°|
|Electron source||up to 10 kW|
|W, Ta, VO2, SiO2, Au, Ti, Cr, Co, Cu, Ni , Fe, Cr2O3, Ag, Al, NiFe, NiCr|
|Additional cost - Au|
20 nm of Au layer for free
Additional cost is 15 CZK/nm for academic users and 20 CZK/nm for commercial users for everything above 20 nm