Cross section/broad beam ion polisher Leica EM TIC3X

Guarentor

Ondřej Man

Description

Machine for polishing broad range of materialographic samples (metals, ceramics, plastics, organic species, composites of various types, porous materials) in cross-section or in planar polishing mode. Features three Ar ion guns displaced mutually by 45°, aiming at the same point, independently controllable. Three sample stages are available: one for ion milling in cross section, a rotary stage for planar polishing and a cryo stage for cross-section polishing of sensitive samples.


Photogallery

     

Specification

Ion source

Ion sourceTriple ion source, single controllable guns
Ion energy1 keV to 10 keV
Source current0.5 to 4.5 mA / 0.1 mA stepsize (per ion source)
Ion current density10 mA/cm² (per ion source)
Ion beam diameter (FWHM)0.8 mm (at 10 keV), 2.5 mm (at 2 keV)
GasArgon, minimal purity 99.999 % (Ar 5.0)

Sample stages

Cooling stage for cross section polishing
temperature rangefrom +30 to –150 °C ±5 °C
warm-up temperaturefrom +1 to +50 °C
sample sizeup to 25 × 20 mm x 5 mm (thick)
stage movementx-direction: ±5 mm; y: ±1 mm; z: 6 mm
Standard stage for cross section polishing
sample sizeup to 50 × 50 mm x 5 to 10 mm (thick)
Mask position accuracy< ±2 μm
Cutting areaDepth > 1 mm, Width > 4 mm
stage movementx-direction: ±5 mm; y: ±1 mm; z: 6 mm
Rotary stage for planar polishing
max. sample sizeØ 38mm / 12mm thick
max. ion beam polished areaØ 25mm (for sample diameter of 25mm)
max. lateral movement settings
sample Ø 38mm+/- 3mm
sample Ø 35mm+/- 5mm
sample Ø 33mm+/- 6mm
sample Ø 30mm+/- 8mm
sample Ø 28mm+/- 9.5mm
sample Ø 25mm+/- 11.5mm
sample < Ø 20mm+/- 12.5mm
ion beam incident angle settings (1.5° increments)
sample Ø 38mm0° – 12°
sample Ø 35mm0° – 13°
sample Ø 33mm0° – 14°
sample Ø 30mm0° – 15°
sample Ø 28mm0° – 16°
sample Ø 25mm0° – 18°
sample Ø 23mm0° – 36°
sample < Ø 20mm0° – 48°
lateral speed setting0.1 – 2mm/s
rotation speed settingLow (~2rpm)
Medium (~6rpm)
High (~10rpm)

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